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Title: Kinetics of the activated dissociative adsorption of methane on the low index planes of nickel single crystal surfaces

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:6368334

We have measured the kinetics of the methane decomposition reaction on Ni(111), Ni(100), and Ni(110) single crystal surfaces under the high incident flux conditions of 1 Torr methane. We find for these processes apparent activation energies of 12.6, 6.4, and 13.3 kcal mol/sup -1/, respectively. Initial methane sticking coefficients at 500 K vary with the Ni surface, but are all --10/sup -8/ to 10/sup -7/. The Ni(110) surface is the most active, followed by Ni(100) and Ni(111). A large (-- factor of 20) kinetic isotope effect is seen for CH/sub 4/ vs CD/sub 4/ on the Ni(100) surface, whereas none is seen on the Ni(110) surface. A comparison is made between measured thermal sticking coefficients and those calculated from the results of recent molecular beam experiments of CH/sub 4/ on Ni(111) and Ni(100) surfaces. Agreement of our results with the Ni(100) beam results is poor, whereas agreement with the Ni(111) beam results is very good. A comparison is also made between our results and rates of the catalytic steam reforming reaction of methane.

Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico 87185
OSTI ID:
6368334
Journal Information:
J. Chem. Phys.; (United States), Vol. 87:4
Country of Publication:
United States
Language:
English