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Composition and deposition temperature dependence of the structure of oxidized thin-film amorphous Tb-Fe

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.342724· OSTI ID:6363042
The microstructure of oxidized amorphous Tb-Fe alloy thin films prepared by magnetron cosputtering has been studied as a function of alloy composition and the substrate temperature at which the films were grown. Transmission electron microscopy and Auger electron spectroscopy with ion-sputter depth profiling were used to characterize the films. The composition of the alloy has no dramatic effect on the oxidation rate; it does, however, effect the microstructure of the ..cap alpha..-Fe/sub 2/O/sub 3/ layer that forms on the alloy. Oxidized alloys originally containing more than 27 at. % Tb show an extremely fine-grained structure, with grain sizes on the order of 30 A. Alloys containing less Tb developed large (1--2 ..mu..m) (001)-oriented single-crystal ..cap alpha..-Fe/sub 2/O/sub 3/ grains amongst the fine-grained ..cap alpha..-Fe/sub 2/O/sub 3/. For alloys with less then 18 at. % Tb, only the large grains remain. Samples grown at deposition temperatures ranging from 85 K to 400 /sup 0/C show a similar structure after oxidation.
Research Organization:
ATandT Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
6363042
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 65:7; ISSN JAPIA
Country of Publication:
United States
Language:
English