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Structural, chemical, and electronic properties of Cu/Ta(110)

Journal Article · · Journal of Physical Chemistry; (United States)
DOI:https://doi.org/10.1021/j100104a029· OSTI ID:6341271
; ;  [1]
  1. Texas A M Univ., College Stations (United States)
The properties of ultrathin Cu films on a Ta(110) substrate have been studied using X-ray photoelectron spectroscopy (XPS), low-energy electron diffraction (LEED), temperature-programmed desorption (TPD), and infrared reflection adsorption spectroscopy (IRAS). For coverages of <1.2 monolayer the Cu overlayers grow pseudomorphic with respect to the Ta substrate. XPS results indicate that the Cu(2p[sub 3/2]) binding energy of the supported Cu atoms is perturbed by +0.3 eV compared to that of the surface atoms in Cu(100). These electronic and physical perturbations induce distinct differences in the chemisorptive properties of the Cu films. This is evidenced by CO TPD results which indicate a 50 K increase in the CO desorption temperature as well as a CO stretching frequency that is 20 cm[sup [minus]1] higher than observed for the Cu(111) surface. A comparison of these results with those previously obtained for Cu overlayers on different substrates shows a correlation among the electronic perturbations of the adlayers, the metal-substrate bond strengths, the CO desorption temperatures, and the C-O stretching frequencies. 60 refs., 13 figs.
OSTI ID:
6341271
Journal Information:
Journal of Physical Chemistry; (United States), Journal Name: Journal of Physical Chemistry; (United States) Vol. 97:2; ISSN JPCHAX; ISSN 0022-3654
Country of Publication:
United States
Language:
English