Ultraviolet damage resistance of laser coatings
The damage resistance of several thin-film materials used in ultraviolet laser optics was measured at 266 and 355 nm. The coatings included single, quarterwave (QW) layers of NaF, LaF/sub 3/, MgF/sub 2/, ThO/sub 2/, Al/sub 2/O/sub 3/, HfO/sub 2/, ZrO/sub 2/, Y/sub 2/O/sub 3/ and SiO/sub 2/, plus multilayer reflectors composed of some of these materials. The substrates were uv-grade fused silica. Single-shot thresholds were obtained with 22 ns and 27 ns (FWHM) pulses at 266 and 355 nm, respectively. One of the samples had previously been tested using 20-ps pulses, providing a pulsewidth comparison. At 266 nm the coating with the highest damage threshold was a QW layer of NaF at 10.8 J/cm/sup 2/ (450 MW/cm/sup 2/), whereas for a maximum reflector of Al/sub 2/O/sub 3//NaF the value was 3.6 J/cm/sup 2/ (154 MW/cm/sup 2/), and the threshold of the maximum reflector was 12.2 J/cm/sup 2/ (470 MW/cm/sup 2/). The results were analyzed to determine correlations with standing-wave electric fields and linear and two-photon absorption. Scaling relationships for wavelength, refractive index and atomic density, and pulsewidth were found.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 6331268
- Report Number(s):
- LA-UR-78-2607; CONF-780982-1; TRN: 79-008803
- Resource Relation:
- Conference: 10. symposium on laser induced damage materials, Boulder, CO, USA, 12 Sep 1978
- Country of Publication:
- United States
- Language:
- English
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