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Title: Method of processing materials using an inductively coupled plasma

Patent ·
OSTI ID:6320665

A method is described for coating a surface in a gas-free environment using an electrically conductive ceramic or metal coating material which is initially in solid form comprising: a. providing inductively coupled plasma apparatus comprising: (1) an electrical induction coil having a central longitudinal axis; (2) a dielectric tubular enclosure centered coaxially on the axis and located inside the coil; (3) a segmented metal radiation shield which is grounded and centered coaxially on the axis inside the enclosure, the shield consisting of elongate fluid-cooled metal shield segments extending parallel to the axis, the segments being in a circular arrangement adjacent the interior surface of the enclosure and being equally spaced such that the shield has a generally tubular configuration, and the shield segments being shaped in cross section so as to occlude line-of-sight transmission of light through the radiation shield; and (4) an outlet for the coating material; b. placing the coating material within the radiation shield; c. evacuating the tubular enclosure; d. heating the coating material by use of the induction coil to vaporize the coating material and to form a plasma from the resulting vapor; and e. providing the surface adjacent to the outlet of the plasma apparatus, in order that material emanating from the outlet is deposited on the surface.

Assignee:
Dept. of Energy, Washington, DC
Patent Number(s):
US 4795879
OSTI ID:
6320665
Resource Relation:
Patent File Date: Filed date 13 Apr 1987
Country of Publication:
United States
Language:
English