Method and source for producing a high concentration of positively charged molecular hydrogen or deuterium ions

Patent · Mon Dec 26 23:00:00 EST 1988

OSTI ID:6315526

Ehlers, K W; Leung, K N

A positive ion source is described for producing a beam of high concentration positively charged molecular ions when supplied with hydrogen or deuterium, and ion source comprising: a plasma chamber constructed so as to minimize the path length of positive ions in the chamber before such ions are extracted therefrom, electron emitting means positioned in the chamber, means for metering hydrogen or deuterium into the chamber, a plasma grid, extractor electrode means located outside the chamber adjacent to an alignment with the extraction opening of the plasma grid for extracting a beam of positive ions from the chamber through the extraction opening, the electron emitting means being located closely adjacent with respect to the plasma grid and closely adjacent to the extraction opening in the plasma grid so that the path length is short in relation to the mean free path of the hydrogen or deuterium molecules in the chamber to achieve a high concentration of hydrogen or deuterium ions and to minimize the production of other ions species by collisions of the positive hydrogen or deuterium ions with hydrogen or deuterium molecules.

• Assignee: Dept. of Energy, Washington, DC
• Patent Number(s): US 4793961
• OSTI ID: 6315526
• Country of Publication: United States
• Language: English

Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CHARGED PARTICLES
CHEMICAL REACTIONS
DESIGN
DEUTERIUM IONS
ELECTRON BEAM ION SOURCES
ELECTRONS
ELEMENTARY PARTICLES
FERMIONS
HYDROGENATION
ION SOURCES
IONS
LEPTONS
METERING
MOLECULAR IONS
PLASMA