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Microstructure and properties of TiB/sub 2/ implanted with 1-MeV nickel

Conference ·
OSTI ID:6264562
Polycrystalline samples of TiB/sub 2/ were implanted at ambient temperatures with 1-MeV Ni/sup +/ ions to a fluence of 1 x 10/sup 17/ ions/cm/sup 2/. This fluence corresponds to a calculated nickel-to-titanium ratio, within the half width of the ion distribution, of approximately 0.12. Analytical electron microscopy was used to study the resultant microstructure. The starting microstructure was modified to a depth of approximately 750 nm, significantly deeper than the calculated peak in the deposited nickel profile of 389 nm. The results also show a change in the character of the microstructure, from one exhibiting a moderate density of tangled dislocations to a high density of small defects, as well as a change in the concentration of nickel as a function of depth from the implanted surface. There was no evidence of nickel precipitation. Surface mechanical properties such as hardness and wear resistance were significantly increased.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6264562
Report Number(s):
CONF-830573-2; ON: DE83014020
Country of Publication:
United States
Language:
English