Tribological properties of diamond films grown by plasma-enhanced chemical vapor deposition

Journal Article · Mon May 15 00:00:00 EDT 1989 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.101197· OSTI ID:6261016

Wong, M S; Meilunas, R; Ong, T P; Chang, R P.H.

Uniform and continuous diamond films have been deposited on Si, Mo, and many other substrates by plasma-enhanced chemical vapor deposition. We have developed processes to enhance the adhesion of diamond films to metal substrates for tribological applications. The tribological properties of the diamond films are found to be significantly different depending on their morphology, grain size, and roughness. However, under all cases tested using a ring-on-block tribotester, it is found that for diamond films with a small grain size of 1--3 ..mu..m, the coefficient of friction of the diamond films sliding against a steel ring under lubrication of a jet of mineral oil is about 0.04.

• Research Organization: Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208
• OSTI ID: 6261016
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:20; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
ADHESION
CARBON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
DATA
DEPOSITION
DIAMONDS
ELEMENTAL MINERALS
ELEMENTS
EXPERIMENTAL DATA
FILMS
GRAIN SIZE
INFORMATION
LUBRICATION
METALS
MICROSTRUCTURE
MINERALS
MOLYBDENUM
MORPHOLOGY
NONMETALS
NUMERICAL DATA
ROUGHNESS
SEMIMETALS
SILICON
SIZE
SUBSTRATES
SURFACE COATING
SURFACE PROPERTIES
THIN FILMS
TRANSITION ELEMENTS
TRIBOLOGY
WEAR