Kinetic energy dependence of dissociative charge--transfer reactions of He sup + , Ne sup + , Ar sup + , Kr sup + , and Xe sup + with silane
- Department of Chemistry, University of Utah, Salt Lake City, UT (USA)
Guided ion-beam techniques are used to measure the cross sections as a function of kinetic energy for reaction of SiH{sub 4} with He{sup +}, Ne{sup +}, Ar{sup +}, Kr{sup +}, and Xe{sup +}. State-specific data for the {sup 2}{ital P}{sub 3/2} ground spin--orbit states of Kr{sup +} and Xe{sup +} are also obtained. The products observed in the He, Ar, and Kr systems are SiH{sup +}{sub {ital x}} for {ital x}=0--3. For the Ne system, formation of SiH{sup +}{sub {ital x}} {ital x} = 0--2, is seen, while in the Xe system only SiH{sup +}{sub 3} and SiH{sup +}{sub 2} are observed. Reactions of He{sup +}, Ne{sup +}, Kr{sup +}, and Xe{sup +} show little dependence on kinetic energy, but for the case of Ar{sup +}, the reaction probability and the product distribution are highly sensitive to the kinetic energy of the system. Thermal reaction rates for all of the reactions are derived and compared with previous measurements. The results for these reactions are explained in terms of vertical ionization from the 1{ital t}{sub 2} and 3{ital a}{sub 1} bands of SiH{sub 4}. The relationships of these reactions to plasma deposition and etching are also discussed.
- OSTI ID:
- 6234052
- Journal Information:
- Journal of Chemical Physics; (USA), Vol. 93:7; ISSN 0021-9606
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
ARGON IONS
CHEMICAL REACTION KINETICS
ION-MOLECULE COLLISIONS
HELIUM IONS
KRYPTON IONS
NEON IONS
SILANES
XENON IONS
ATOMIC IONS
CATIONS
CHARGE EXCHANGE
CHEMICAL VAPOR DEPOSITION
CROSS SECTIONS
DISSOCIATION
ENERGY DEPENDENCE
ION BEAMS
KINETIC ENERGY
BEAMS
CHARGED PARTICLES
CHEMICAL COATING
COLLISIONS
DEPOSITION
ENERGY
HYDRIDES
HYDROGEN COMPOUNDS
ION COLLISIONS
IONS
KINETICS
MOLECULE COLLISIONS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
REACTION KINETICS
SILICON COMPOUNDS
SURFACE COATING
640304* - Atomic
Molecular & Chemical Physics- Collision Phenomena
400201 - Chemical & Physicochemical Properties