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Title: Ion-beam-induced metal-insulator transition in YBa/sub 2/Cu/sub 3/O/sub 7/minus/delta/: A mobility edge

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)

We have studied the temperature-dependent resistivity and Hall coefficient of epitaxial YBa/sub 2/Cu/sub 3/O/sub 7/minus/delta/ films as a function of ion-beam-induced damage. At low ion fluences the films behave like typical metals above the superconducting transition. At higher ion fluences, the material goes continuously through the metal-insulator transition with a resistivity that varies like exp(/ital T//sup /minus/1/2/) but with a Hall coefficient that changes very little. This implies that the transition is a result of a reduction in mobility rather than a drop in carrier density.

Research Organization:
ATandT Bell Laboratories, Murray Hill, New Jersey 07974(US)
OSTI ID:
6225382
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Vol. 39:16, Issue 16
Country of Publication:
United States
Language:
English