Reaction of amorphous Ni-W and Ni-N-W films with substrate silicon

Journal Article · Thu Nov 15 04:00:00 EST 1984 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.333804· OSTI ID:6216147

Zhu, M F; Suni, I; Nicolet, M; Sands, T

Amorphous films of Ni-W and Ni-N-W were deposited on single-crystal silicon with discharge gases of Ar or Ar+N/sub 2/ by rf cosputtering of Ni and W. The reaction of these Ni-W and Ni-N-W films with the Si substrate were studied in the temperature range of 450--750 /sup 0/C by a combination of backscattering spectrometry, x-ray diffraction, cross-sectional transmission electron microscopy, and resistivity measurements. Films with composition Ni/sub 36/W/sub 64/ are stable below 500 /sup 0/C. NiSi and NiSi/sub 2/ form at 500 /sup 0/C, and WSi/sub 2/ forms rapidly in the temperature range of 625--650 /sup 0/C. The nickel silicide forms adjacent to and within the silicon, while the outer layer becomes a mixture of WSi/sub 2/ and NiSi/sub 2/. The morphologies of the reacted layers are revealed by cross-sectional transmission electron microscopy. The crystallization temperature of amorphous Ni/sub 36/W/sub 64/ films on SiO/sub 2/ is near 650 /sup 0/C also. Adding nitrogen to form amorphous Ni/sub 30/N/sub 21/W/sub 49/ films lowers the crystallization temperature, but raises the reaction temperature with Si to 750 /sup 0/C.

• Research Organization: California Institute of Technology, Pasadena, California 91125
• OSTI ID: 6216147
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 56:10; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360102 -- Metals & Alloys-- Structure & Phase Studies
ALLOY SYSTEMS
ALLOYS
AMORPHOUS STATE
ARGON
BINARY ALLOY SYSTEMS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
COHERENT SCATTERING
CRYSTALLIZATION
DIFFRACTION
ELECTRON MICROSCOPY
ELEMENTS
FLUIDS
GASES
HIGH TEMPERATURE
INTERFACES
METALLIC GLASSES
METALS
MICROSCOPY
MORPHOLOGY
NICKEL
NICKEL ALLOYS
NICKEL COMPOUNDS
NICKEL SILICIDES
NITRIDATION
NITROGEN
NONMETALS
PHASE TRANSFORMATIONS
RARE GASES
REFRACTORY METAL COMPOUNDS
SCATTERING
SEMIMETALS
SILICIDES
SILICON
SILICON COMPOUNDS
SPUTTERING
SYNTHESIS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TRANSMISSION ELECTRON MICROSCOPY
TUNGSTEN ALLOYS
TUNGSTEN COMPOUNDS
TUNGSTEN SILICIDES
VERY HIGH TEMPERATURE
X-RAY DIFFRACTION