Microstructure of Y/sub 2/O/sub 3/ fluxed hot-pressed silicon nitride

Journal Article · Wed Mar 01 04:00:00 EST 1978 · J. Am. Ceram. Soc.; (United States)

DOI:https://doi.org/10.1111/j.1151-2916.1978.tb09251.x· OSTI ID:6214533

Clarke, D R; Thomas, G

Detailed microstructural analysis of a 10 mol% Y/sub 2/O/sub 3/ fluxed hot-pressed silicon nitride reveals that, in addition to the yttrium-silicon oxynitride phase located at the multiple Si/sub 3/N/sub 4/ grain junctions, there is a thin boundary phase 10 to 80 A wide separating the silicon nitride and the oxynitride grains. Also, x-ray microanalysis from regions as small as 200 A across demonstrates that the yttrium-silicon oxynitride, Y/sub 2/Si(Si/sub 2/O/sub 3/N/sub 4/), phase can accommodate appreciable quantities of Ti, W, Fe, Ni, Co, Ca, Mg, Al, and Zn in solid solution. This finding, together with observations of highly prismatic Si/sub 3/N/sub 4/ grains enveloped by Y/sub 2/Si(Si/sub 2/O/sub 3/N/sub 4/), suggests that densification occurred by a liquid-phase ''solution-reprecipitation'' process.

• Research Organization: Univ. of California, Berkeley
• OSTI ID: 6214533
• Journal Information: J. Am. Ceram. Soc.; (United States), Journal Name: J. Am. Ceram. Soc.; (United States) Vol. 61:3-4; ISSN JACTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202 -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
CHALCOGENIDES
CRYSTAL STRUCTURE
FABRICATION
GRAIN BOUNDARIES
HOT PRESSING
IMPURITIES
MATERIALS WORKING
MICROSTRUCTURE
NITRIDES
NITROGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PNICTIDES
PRESSING
SILICON COMPOUNDS
SILICON NITRIDES
TRANSITION ELEMENT COMPOUNDS
VERY HIGH TEMPERATURE
YTTRIUM COMPOUNDS
YTTRIUM OXIDES