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Title: Self-scrubbing removal of submicron particles from gaseous effluents

Patent ·
OSTI ID:6212803

A method is described for removal of submicron particles from gaseous effluents which contain sulfur dioxide among other substances, comprising the steps of: injecting liquid water droplets into a gaseous effluent containing submicron particles, said effluent being at a temperature higher than the bulk water dew point, said injection step cooling the effluent to approximately the bulk dew point of water and causing at least some but less than all of the water to evaporate; delaying the injection of any further substances into the effluent until the effluent and the injected water reach a substantially uniform temperature at approximately the bulk water dew point; following said delay, injecting gaseous ammonia into the resulting mixture of effluent and water in order to cause ammonium sulfite on said submicron particles, thus increasing the size of said particles, and also such as to cause water to condense onto the ammonium sulfite-coated particles, thus further increasing the size of said particles; and separating at least some of the resultant enlarged particles from the effluent.

Assignee:
Energy and Environmental Research Corp., Whitehouse, NJ (United States)
Patent Number(s):
US 5225175; A
Application Number:
PPN: US 7-901820
OSTI ID:
6212803
Resource Relation:
Patent File Date: 22 Jun 1992
Country of Publication:
United States
Language:
English