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Time-of-flight mass spectrometer for investigating hydrogen isotope interactions

Journal Article · · Fusion Technol.; (United States)
OSTI ID:6188970
Time-of-flight Secondary Ion Mass Spectrometry/Direct Recoil (TOF SIMS/DR) techniques and apparatus are described which hold substantial promise for further understanding the behavior of hydrogen isotopes at surfaces. The analytical apparatus is interfaced to a tritium-compatible exposure cell within a glovebox by means of a vacuum load-lock. Apparatus consists of a pulse Li/sup +/ beam for H/D/T ratios (DR), a DC or pulsed Cs/sup +/ beam for sputtering or TOF/SIMS (for enhancement of negative ion yields), and a dual channel 10 MHz time-digitizing histogrammer for fast data rates. Prototype apparatus has already proved useful in understanding the rates at which hydrogen isotopes may be exchanged from material surfaces upon exposure to water vapor. An extremely fast and a second much slower process characterize the exchange at Si and stainless steel oxyhydroxide surface films. The fast process is limited by the rate at which water molecules strike the top monolayer of the surface. H/D exchange tunneling appears to be involved. The slow process appears to be the bulk diffusion-limited exchange rate within the oxyhydroxide film. Diffusion constants have been derived.
Research Organization:
Monsanto Research Corp. - Mound, Miamisburg, OH (US); Ionwerks, Inc., Houston, TX (US)
OSTI ID:
6188970
Journal Information:
Fusion Technol.; (United States), Journal Name: Fusion Technol.; (United States) Vol. 14:2; ISSN FUSTE
Country of Publication:
United States
Language:
English