Ion induced chemical bonding of carbon with Ta as studied by Auger electron spectroscopy and slow electron energy loss spectroscopy

Journal Article · Sun Dec 15 23:00:00 EST 1991 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.105746· OSTI ID:6185500

Sharma, J K.N.; Bera, S; Chakraborty, B R ^[1]

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1. National Physical Laboratory, K. S. Krishnan Road, New Delhi 110 012 (India)

The chemical bonding of contaminants like carbon and oxygen on the surface of Ta and Ta{sub 2}O{sub 5} films due to Ar{sup +} ion bombardment during sputter etching, has been studied using Auger electron spectroscopy and slow electron energy loss spectroscopy. Finger printing of C KLL peak shows that the energy separation between the major positive-going and negative-going excursions, which is 23 eV in the pure graphitic form, reduces to 6 eV indicating the carbide formation after ion bombardment. It is assumed that the chemical reaction is initiated by an increase in {pi} electrons in the graphite due to ion bombardment. The carbide formation is found to be much less effected in Ta{sub 2}O{sub 5} films which has been attributed to the absence of free {ital d} electrons of Ta in the oxide.

• OSTI ID: 6185500
• Journal Information: Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 59:25; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

665300* -- Interactions Between Beams & Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALLOYS
ANIMALS
AQUATIC ORGANISMS
AUGER ELECTRON SPECTROSCOPY
CARBON ADDITIONS
CHEMICAL BONDS
CONTAMINATION
EEL
ELECTRON SPECTROSCOPY
ELEMENTS
ETCHING
FISHES
METALS
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
REFRACTORY METAL COMPOUNDS
SPECTROSCOPY
SPUTTERING
SURFACE CONTAMINATION
SURFACE FINISHING
TANTALATES
TANTALUM
TANTALUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
VERTEBRATES