Interaction of Cu overlayers with W(001) studied by low-energy alkali ion scattering

Journal Article · Mon May 01 04:00:00 EDT 1989 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.575990· OSTI ID:6185076

Overbury, S H; Mullins, D R

Low-energy alkali ion scattering, Auger electron spectroscopy, and low-energy electron diffraction have been used to study the structure of ultrathin Cu overlayers on W(100). Incident polar and azimuthal angular scans of the Cu and W single-scattering intensity have been obtained as a function of Cu coverage and annealing temperature, and are used to evaluate various models for the surface structure. Dosing submonolayer amounts of Cu near room temperature results in two-dimensional islands of Cu bonded in fourfold hollows and some dispersed Cu atoms. Annealing at 1000 K causes irreversible displacement of first-layer W atoms and Cu incorporation, as indicated by a pronounced shift in the Li/sup +//W low-angle shadowing edge, and the changes in the shape of the Li/sup +//Cu edge. This result is interesting in view of the immiscibility of Cu and W. Analysis of contour plots of the Li/sup +//Cu single scattering support a growth of up to two pseudomorphic layers of Cu on W(001); although there is Cu and W mixing at the interface.

• Research Organization: Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
• OSTI ID: 6185076
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:3; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
ANGULAR DISTRIBUTION
ANNEALING
CHEMICAL REACTION KINETICS
COATINGS
COPPER
CRYSTAL STRUCTURE
DEPOSITION
DISTRIBUTION
ELEMENTS
EPITAXY
FILMS
HEAT TREATMENTS
INTERFACES
ION SPECTROSCOPY
KINETICS
METALS
REACTION KINETICS
SPECTROSCOPY
SURFACE PROPERTIES
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN
VAPOR PHASE EPITAXY