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Tunneling current density j(V) for Pb--In--Au alloy junctions and tunnel barrier modeling

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.332326· OSTI ID:6163243

Tunnel barriers formed by rf oxidation of Pb--In--Au alloys and consisting largely of In/sub 2/O/sub 3/ have been studied by measuring the current density as a function of applied voltage j(V) for voltages up to 1 V. The junctions studied here, which were oxidized on Pb- or photoresist-coated rf cathodes, showed no evidence of a barrier height below about 1 eV. A trapezoidal barrier with a height of at least 1 eV and a thickness equal to that of the oxide film, roughly 6 nm, would have a tunneling current far below that observed for these junctions. Furthermore, the measured j(V) curves were inconsistent with those calculated for a trapezoidal barrier, even for a barrier thickness less than the physical oxide thickness. The j(V) curves were, however, similar to those calculated for tunneling through a Schottky barrier in the indium oxide at the interface with the counterelectrode. Such a barrier, which is also suggested by recent measurements of oxide thickness and junction electrical properties at low voltages, might be expected to form between the metal electrodes and In/sub 2/O/sub 3/, which can be a degenerately-doped n-type semiconductor.

Research Organization:
IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
OSTI ID:
6163243
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:5; ISSN JAPIA
Country of Publication:
United States
Language:
English