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Step structure and ordering in GaInP

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.366580· OSTI ID:615371
;  [1]
  1. Department of Materials Science and Engineering, University of Utah, Salt Lake City, Utah84112 (United States)
Steps are known to affect the ordering phenomenon in GaInP; [110] steps assist ordering and [{bar 1}10] steps retard ordering. However, the mechanism leading to this behavior has not been determined. In this paper, the step spacing is used as a semiquantitative indicator of the attachment of adatoms at the step edge for organometallic vapor phase epitaxial growth on singular (001) GaAs substrates. The step spacing and degree of order in the epitaxial layers have been studied as a function of temperature and the flow rate of the P precursor for both tertiarybutylphosphine (TBP) and phosphine. As the flow rate of the P precursor is lowered beyond a certain critical point, both the degree of order and the step spacing are seen to decrease together. The behavior is the same for TBP and for PH{sub 3}. Similarly, as the growth temperature is increased above a certain value, the step spacing and order parameter decrease together. This suggests a relationship between adatom attachment at steps and the ordering mechanism. Possible explanations for these phenomena are explored. At low temperatures, the degree of order is reduced and the step spacing decreases exponentially. The data suggest that the reduction in the surface diffusion coefficient with decreasing temperature is the main factor acting to reduce both the step spacing and the degree of order. However, the increasing adatom sticking coefficient at both step edges expected at low temperatures will affect both phenomena as well. {copyright} {ital 1998 American Institute of Physics.}
OSTI ID:
615371
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 7 Vol. 83; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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