Copper sulfide films deposited by cylindrical magnetron reactive sputtering

Journal Article · Thu Mar 01 04:00:00 EST 1979 · J. Vac. Sci. Technol.; (United States)

DOI:https://doi.org/10.1116/1.569907· OSTI ID:6141539

Jonath, A D; Anderson, W W; Thornton, J A; Cornog, D G

Copper sulfide coatings 150 nm thick were deposited by reactive sputtering using a copper cylindrical magnetron sputtering source in an Ar--H/sub 2/S atmosphere at constant discharge current and varies H/sub 2/S injection rates. Borosilicate plate-substrates were maintained at temperatures of 130/sup 0/ and 35/sup 0/C, which are above and below transition temperatures for the Cu/sub x/S phases of interest. Above a critical injection rate resistivity data indicate two types of materials: a high-resistivity type (approx.100 ..cap omega.. cm) often exhibiting Cu-rich nodules, and a low-resistivity type (approx.0.01 ..cap omega.. cm). The types are generally associated with the high and low substrate temperatures respectively. Hall mobilities were in the 1--6 cm/sup 2//V s range for both materials. Optical absorption, resistivity-versus-temperature, and x-ray diffraction measurements indicate that the high resistivity material consists largely of near-stoichiometric chalcocite and that the low resistivity material is a mixture of chalcocite and djurleite.

• Research Organization: Lockheed Palo Alto Research Laboratory, Palo Alto, California 94304
• OSTI ID: 6141539
• Journal Information: J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 16:2; ISSN JVSTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
CATHODE SPUTTERING
CHALCOGENIDES
COATINGS
COHERENT SCATTERING
COPPER COMPOUNDS
COPPER SULFIDES
DEPOSITION
DIFFRACTION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
FILMS
HALL EFFECT
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
PHYSICAL PROPERTIES
SCATTERING
SPUTTERING
SULFIDES
SULFUR COMPOUNDS
TEMPERATURE DEPENDENCE
TRANSITION ELEMENT COMPOUNDS
X-RAY DIFFRACTION