Mathematical modeling of processes occurring in continuous gas-epitaxy reactors. I. Gasdynamic processes
Journal Article
·
· Sov. Phys. - Tech. Phys. (Engl. Transl.); (United States)
OSTI ID:6140226
A numerical study is made of the gas-flow regimes in a vertical cylindrical gas-epitaxy reactor. The calculation is done using a simplified system of Navier-Stokes equations valid for small Mach numbers. The influence of the gasdynamic of the flow on the growth conditions is studied for gallium arsenide films growing in a mixture of trimethyl gallium, arsine, and hydrogen. The results of the calculation are compared with the experimental behavior of the growth rate. 40 references.
- Research Organization:
- Fiziko-Tekhnicheskii Institut, Leningrad, USSR
- OSTI ID:
- 6140226
- Journal Information:
- Sov. Phys. - Tech. Phys. (Engl. Transl.); (United States), Journal Name: Sov. Phys. - Tech. Phys. (Engl. Transl.); (United States) Vol. 31; ISSN SPTPA
- Country of Publication:
- United States
- Language:
- English
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