Photoelectron spectra of polysilanes

Journal Article · Sat Mar 15 04:00:00 EST 1986 · Phys. Rev. B: Condens. Matter; (United States)

DOI:https://doi.org/10.1103/PhysRevB.33.4203· OSTI ID:6117786

Loubriel, G; Zeigler, J

Some organopolysilanes (high-molecular-weight polymers which only contain silicon atoms in their backbone) can be used as highly sensitive, self-developing uv photoresists. To understand the electronic structure of polysilanes and help rationalize their solid-state uv photosensitivity, we have recorded the photoelectron spectra of several polysilanes: poly(..beta..-naphthylmethylsilane), poly(phenylmethylsilane, poly(n-dodecylmethylsilane, and poly(n-propylmethylsilane). We find that if the polymer photoemission spectra can be described in terms of backbone Si-Si and side-chain Si-C levels which do not hybridize (as in the alkyl polysilanes), then the solid-state uv sensitivity of the polymer is high. An explanation of this correlation in terms of the degree of hybridization of the low-lying bonding and antibonding Si-Si levels with the levels of the carbon side-group molecule will be presented.

• Research Organization: Sandia National Laboratories, Albuquerque, New Mexico 87185
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 6117786
• Journal Information: Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 33:6; ISSN PRBMD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
CHEMICAL BONDS
ELECTRICAL EQUIPMENT
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELECTRONIC STRUCTURE
EQUIPMENT
HYDRIDES
HYDROGEN COMPOUNDS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
PHOTORESISTORS
PHOTOSENSITIVITY
POLYMERS
RADIATIONS
RESISTORS
SENSITIVITY
SILANES
SILICON COMPOUNDS
SPECTROSCOPY
ULTRAVIOLET RADIATION