Multiple wavelength excimer laser

Patent · Tue Mar 28 04:00:00 EST 1989

OSTI ID:6089193

Nighan, W L; Sauerbrey, R A; Tittel, F K

A multiple wavelength excimer laser is described, comprising: an enclosure having an optically transmissive portion and a longitudinal interior design disposed about at least one optical axis; predetermined quantities of a buffer gas, xenon, and a fluorine donor gas contained within the enclosure; excitation means for exciting the gas mixture to produce quantities of xenon fluoride excimer in the excited B and C states; means disposed along at least one optical axis and bounding a predetermined portion of the gas mixture means to form an optical cavity, having predetermined reflectivity characteristics in the ultraviolet and the visible portion of the spectrum the gas mixture means, the excitation means, and the optical means being interrelated such that the quantities of xenon fluoride excimer form population inversions for both the B..-->..X and C..-->..A transitions and such that the gas mixture means within the optical cavity has sufficient optical gain on both the B..-->..X transition and the C..-->.. A transition of xenon fluoride such that the energy conversion efficiencies of the visible and ultraviolet radiation differ by less than a factor of 10, whereby ultraviolet radiation in the B..-->..X band and visible radiation in the C..-->..A band are amplified simultaneously within the optical cavity.

• Assignee: United Technologies Corp., Hartford, CT
• Patent Number(s): US 4817096
• OSTI ID: 6089193
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
DESIGN
ELEMENTS
ENERGY-LEVEL TRANSITIONS
EXCIMER LASERS
EXCITATION
FLUIDS
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
HALOGENS
LASERS
NONMETALS
OPTICAL SYSTEMS
RARE GAS COMPOUNDS
RARE GASES
WAVELENGTHS
XENON
XENON COMPOUNDS
XENON FLUORIDES