skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Self-pumping impurity control by in-situ metal deposition

Technical Report ·
DOI:https://doi.org/10.2172/6078289· OSTI ID:6078289

A system for in-situ removal of helium by trapping in freshly deposited metal surface layers of a limiter or divertor has been studied. The system would trap helium on a limiter front surface, or a divertor plate, at low plasma edge temperatures, or in a limiter slot region, at high edge temperatures. Fresh material, introduced to the plasma and/or scrape-off zone, would be added at a rate of about five times the alpha production rate. The material would be reprocessed periodically, e.g., once year. Possible materials are nickel, vanadium, niobium, and tantalum. Advantages of a self-pumping system are the absence of vacuum ducts and pumps, and the minimization of tritium processing and inventory.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
DOE Contract Number:
W-31-109-ENG-38
OSTI ID:
6078289
Report Number(s):
ANL/FPP/TM-174; ON: DE83014265
Country of Publication:
United States
Language:
English