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Title: Effect of impurity trapping on the capacitance-voltage characteristics of n-GaAs/N-AlGaAs heterojunctions

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.96520· OSTI ID:6047570

We have studied the capacitance-voltage (C-V) characteristics of Schottky barriers on inverted n-GaAs/N-AlGaAs and normal N-AlGaAs/n-GaAs heterojunctions. Impurities introduced during film growth produced a negative sheet charge of 6.0 x 10 cm S at the interface of the inverted n-GaAs/N-AlGaAs heterojunction. The effectiveness of GaAs quantum wells in trapping these impurities was investigated. GaAs quantum wells 20 A wide were placed in intervals of 2500 A for the first 0.75 m of the AlGaAs layer; in the last 0.25 m, the periodicity of the quantum wells was progressively decreased by half with the last quantum well placed at about 160 A from the GaAs/AlGaAs interface. The resulting measured interface charge concentration of 4.4 x 10 cm S is more than a magnitude lower than measured before the use of the quantum wells and is essentially at the limit of the accuracy of the C-V technique for this structure.

Research Organization:
School of Electrical Engineering, Purdue University, West Lafayette, Indiana 47907
OSTI ID:
6047570
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 48:6
Country of Publication:
United States
Language:
English