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Microstructures and growth rates of FeS on pure and not-so-pure iron

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2115713· OSTI ID:6037628
The sulfidation rates of iron to Fe/sub 1-xs/ have been measured for three batches of nominally pure iron, and rather significant differences in microstructures and growth rates have been observed. The measurements were made at 700/sup 0/C over the sulfur pressure range of 1-10/sup 3/ Pa as part of a study of the general aspects of the microstructures and growth rates of this highly nonstoichiometric sulfide of iron. Apparently due to rather small differences in silicon content, 0-40 ppm, the scale microstructure, scale adhesion, and growth rate vary significantly. Silicon that is dissolved as small Fe/sub 2/SiO/sub 4/ particles in the iron accumulates at the scale/metal interface during the sulfidation reaction causing a layered growth. The overall reaction rate is reduced at the lowest pressures, but remains unchanged at higher pressures. 7 references, 7 figures, 1 table.
Research Organization:
Oak Ridge National Lab., TN
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6037628
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 131:4; ISSN JESOA
Country of Publication:
United States
Language:
English