Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Photosensitized electron transfer processes in SiO/sub 2/ colloids and sodium lauryl sulfate micellar sytems: correlation of quantum yields with interfacial surface potentials

Journal Article · · Proc. Natl. Acad. Sci. U.S.A.; (United States)
 [1]; ; ;
  1. Agricultural Univ., Wageningen, Netherlands

The effectiveness of negatively charged colloidal SiO/sub 2/ particles in controlling photosensitized electron transfer reactions has been studied and compared with that of the negatively charged sodium lauryl sulfate (NaLauSO/sub 4/) micellar system. In particular, the photosensitized reduction of the zwitterionic electron acceptor propylviologen sulfonate (PVS/sup 0/) with tris(2,2'-bi-pyridinium)ruthenium(II) (Ru(bipy)/sub 3//sup 2 +/) as the sensitizer and triethanolamine as the electron donor is found to have a quantum yield of 0.033 for formation of the radical anion (PVS) in the SiO/sub 2/ colloid compared with 0.005 in the homogeneous system and 0.0086 in a NaLauSO/sub 4/ micellar solution. The higher quantum yields obtained with the SiO/sub 2/ colloidal system are attributed to substantial stabilization against back reaction of the intermediate photoproducts - i.e., Ru(bipy)/sub 3//sup 3 +/ and PVS/sup -/ - by electrostatic repulsion of the reduced electron acceptor from the negatively charged particle surface. The binding properties of the SiO/sub 2/ particles and NaLauSO/sub 4/ micelles were investigated by flow dialysis. The results show that the sensitizer binds to both interfaces and that the SiO/sub 2/ interface is characterized by much higher surface potential than the micellar interface. The effect of ionic strength on the surface potential was estimated from the Gouy-Chapman theory, and the measured quantum yields of photosensitized electron transfer were correlated shows that the quantum yield is not affected by surface potentials smaller than approx. = -40 mV. At larger potentials, the quantum yield increases rapidly. These results indicate that the surface potential is the dominant factor in the quantum yield improvement for PVS/sup 0/ reduction.

DOE Contract Number:
W-7405-ENG-48
OSTI ID:
6037022
Journal Information:
Proc. Natl. Acad. Sci. U.S.A.; (United States), Journal Name: Proc. Natl. Acad. Sci. U.S.A.; (United States) Vol. 78:10; ISSN PNASA
Country of Publication:
United States
Language:
English