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Title: Reflective optical imaging system for extreme ultraviolet wavelengths

Abstract

A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 [mu]m, and preferably less than 100 [mu]m. An image resolution of features less than 0.05-0.1 [mu]m, is obtained over a large area field; i.e., 25.4 mm [times] 25.4 mm, with a distortion less than 0.1 of the resolution over the image field.

Inventors:
;
Publication Date:
OSTI Identifier:
6036338
Patent Number(s):
US 5212588; A
Application Number:
PPN: US 7-682780
Assignee:
Dept. of Energy, Washington, DC (United States) IMS; EDB-93-122642
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Resource Relation:
Patent File Date: 9 Apr 1991
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; OPTICAL SYSTEMS; DESIGN; EXTREME ULTRAVIOLET RADIATION; IMAGES; MIRRORS; REFLECTION; SPATIAL RESOLUTION; ELECTROMAGNETIC RADIATION; RADIATIONS; RESOLUTION; ULTRAVIOLET RADIATION; 440800* - Miscellaneous Instrumentation- (1990-)

Citation Formats

Viswanathan, V.K., and Newnam, B.E. Reflective optical imaging system for extreme ultraviolet wavelengths. United States: N. p., 1993. Web.
Viswanathan, V.K., & Newnam, B.E. Reflective optical imaging system for extreme ultraviolet wavelengths. United States.
Viswanathan, V.K., and Newnam, B.E. Tue . "Reflective optical imaging system for extreme ultraviolet wavelengths". United States.
@article{osti_6036338,
title = {Reflective optical imaging system for extreme ultraviolet wavelengths},
author = {Viswanathan, V.K. and Newnam, B.E.},
abstractNote = {A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 [mu]m, and preferably less than 100 [mu]m. An image resolution of features less than 0.05-0.1 [mu]m, is obtained over a large area field; i.e., 25.4 mm [times] 25.4 mm, with a distortion less than 0.1 of the resolution over the image field.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {5}
}