Reflective optical imaging system for extreme ultraviolet wavelengths
Patent
·
OSTI ID:6036338
A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 [mu]m, and preferably less than 100 [mu]m. An image resolution of features less than 0.05-0.1 [mu]m, is obtained over a large area field; i.e., 25.4 mm [times] 25.4 mm, with a distortion less than 0.1 of the resolution over the image field.
- DOE Contract Number:
- W-7405-ENG-36
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- A; US 5212588
- Application Number:
- PPN: US 7-682780
- OSTI ID:
- 6036338
- Country of Publication:
- United States
- Language:
- English
Similar Records
Reflective optical imaging system for extreme ultraviolet wavelengths
Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography
Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography
Patent
·
Thu Dec 31 23:00:00 EST 1992
·
OSTI ID:868790
Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography
Conference
·
Mon Aug 01 00:00:00 EDT 1994
·
OSTI ID:10174212
Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography
Journal Article
·
Mon Oct 31 23:00:00 EST 1994
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
·
OSTI ID:7154184