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Spectroscopic study of anode plasmas in a microsecond electron beam diode

Journal Article · · IEEE Trans. Plasma Sci.; (United States)
Experiments have been performed to investigate the visible emissions (370-600 nm) from long-pulse electron-beam-driven carbon anode plasmas, and to correlate the spectroscopic evidence for ions with deviations of the diode current and voltage from Child-Langmuir behavior. Electron beams had peak voltages of -0.8 MV, current densities approaching 10/sup 3/ A/cm/sup 2/, and pulselengths of about 1 ..mu..s. Diode closure resulted in three phases of the beam/plasma evolution. In stage I the deposited electron dose was smaller than that required for anode plasma optical emission (less than or equal to250 J/gr). No deviations of the diode operation from conventional Child-Langmuir scaling were observed. In stage II, the electron dose was large enough for anode plasma formation before shorting (less than or equal to350 J/gr), and low-intensity optical emission was primarily from CII and CIII. During stage II, two types of non-Child-Langmuir diode behavior occurred due to the presence of an anode plasma. An anomalous voltage peaking behavior occurred at an average dose of 740 J/gr, at about 80 percent of the diode shorting time. The diode impedance was constant during this voltage peaking behavior, contrary to the impedance collapse expected from Child-Langmuir behavior in a closing diode. This voltage peaking was accompanied by an increase in continuum emission, particularly at shorter wavelengths. A bipolar impedance level was occasionally observed before voltage peaking, at an average dose of 4120 J/gr, at about 66 percent of the predicted shorting time. During stage III, an intense vacuum arc mode, the cathode plasma shorted the anode-cathode (A-K) gap, resulting in intense optical emission from CI through CIV on noncrowbarred pulses, and from CII, C/sub 2/, CH, and H on crowbarred pulses.
Research Organization:
Intense Energy Beam Interaction Lab., Dept. of Nuclear Engineering, Univ. of Michigan, Ann Arbor, MI 48109-2104
OSTI ID:
6023065
Journal Information:
IEEE Trans. Plasma Sci.; (United States), Journal Name: IEEE Trans. Plasma Sci.; (United States) Vol. PS-15:4; ISSN ITPSB
Country of Publication:
United States
Language:
English