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Ion-induced amorphous and crystalline phase formation in Al/Ni, Al/Pd, and Al/Pt thin films

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94068· OSTI ID:6017097
Amorphization by ion beam irradiation of multilayered samples of Al/Pt, Al/Pd, and Al/Ni has been investigated by selected area diffraction and Rutherford backscattering. With a dose of 2 x 10/sup 14/ Xe ions/cm/sup 2/, uniform mixing is achieved in the Al/Pt system and the amorphous phase is produced over a large composition range. In the Al/Pd and Al/Ni systems, amorphous phases or the equilibrium, crystalline phases are formed depending on the composition of the films. The same results were found when the samples were annealed to form crystalline phases before bombardment. For thin films of these fcc metals, only the simplest intermetallics, NiAl and PdAl, (primitive cubic structures with 2 atoms/cell) were formed in crystalline form by ion-beam irradiation.
Research Organization:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
OSTI ID:
6017097
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 42:8; ISSN APPLA
Country of Publication:
United States
Language:
English