Method of and apparatus for pattern recognition
This patent describes a method of recognizing a pattern in a test object. The method consists of: specifying properties characteristic of the pattern; specifying discrete ranges of values of the properties; measuring the values of the properties in the test object; arranging the measured values in at least one test histogram; determining a reference set of values of the properties and arranging the set as at least a first reference histogram; and comparing the test and reference histograms by determination of the value of a function which provides a measure of the amount of information necessary to express the at least one test histogram in terms of the optimum code for describing at least the first reference histogram.
- Assignee:
- Wayland Res., Inc., Wayland, MA
- Patent Number(s):
- US 4567610
- OSTI ID:
- 6007283
- Country of Publication:
- United States
- Language:
- English
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