Dry etching of niobium using CCl sub 2 F sub 2 and CF sub 4 : A comparison
- Hypres Incorporated, Elmsford, NY (USA)
Freon 12 is compared to freon 14 as an etchant for patterning of high density superconductive circuits. Both reactive ion and plasma regimes are examined. CCl{sub 2}F{sub 2} is observed to be an excellent niobium etchant, offering significant advantages over similar CF{sub 4} processes. Improvements include a six-fold increase of Nb:photoresist selectivity, while Nb:SiO{sub 2} selectivity is increased by over 1400%. Critical dimension control was also enhanced through the reduction of photo to etch bias from between 1.09 and 0.5 {mu}m to 0.14 {mu}m. Diminished photoresist loss and the elimination of photoresist undercut are the reasons for this improvement. SiO{sub 2} surface texturing is not observed with either of the two etchants. Finally, data are presented that demonstrate the importance of electrode cooling in obtaining etch rate repeatability.
- OSTI ID:
- 6003057
- Journal Information:
- Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 68:10; ISSN 0021-8979; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Method for etching thin films of niobium and niobium-containing compounds for preparing superconductive circuits
Method for etching thin films of niobium and niobium-containing compounds for preparing superconductive circuits
Related Subjects
360105* -- Metals & Alloys-- Corrosion & Erosion
426001 -- Engineering-- Superconducting Devices & Circuits-- (1990-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ELECTRONIC CIRCUITS
ELEMENTS
ETCHING
FREONS
HALOGENATED ALIPHATIC HYDROCARBONS
MANUFACTURING
METALS
MICROELECTRONICS
NIOBIUM
ORGANIC COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
RELIABILITY
SUPERCONDUCTORS
SURFACE FINISHING
TRANSITION ELEMENTS