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Title: In situ growth and properties of single-crystalline-like La sub 2 minus x Sr sub x CuO sub 4 epitaxial films by off-axis sputtering (US)

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.105876· OSTI ID:5998672
; ; ; ;  [1]
  1. AT T Bell Laboratories, Murray Hill, New Jersey (USA)

Excellent quality La{sub 2{minus}x}Sr{sub x}CuO{sub 4} epitaxial films of 0.07{le}{ital x}{le}0.34 in (001) and (103) orientations have been successfully grown {ital in} {ital situ} on SrTiO{sub 3}, LaAlO{sub 3}, and Y-stabilized ZrO{sub 2} substrates using 90{degree} off-axis sputtering. A record low ion channeling minimal yield {chi}{sub min} of 1.9% is observed for the first time, and a {chi}{sub min} of 3% is routinely attained. The surface exhibits a featureless morphology under high-resolution scanning electron microscope, suggesting a roughness {le}30--40 A. Superconductivity is maximized at Sr=0.15 with a typical {ital T}{sub {ital c}} ({ital R}=0) of 35 K, a {ital J}{sub {ital c}} (4.2 K) of 1--3{times}10{sup 6} A/cm{sup 2}, and a normal state resistivity two to three times lower than single crystals. {ital T}{sub {ital c}} shows a marked reduction with thickness, and the results are interpreted on the basis of partially relieved strained-layer growth coupled with a sensitive dependence of {ital T}{sub {ital c}} on uniaxial stress.

OSTI ID:
5998672
Journal Information:
Applied Physics Letters; (United States), Vol. 59:21; ISSN 0003-6951
Country of Publication:
United States
Language:
English