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Refractive-index dependence of pulsed-laser-induced damage

Journal Article · · Opt. Lett.; (United States)
DOI:https://doi.org/10.1364/OL.4.000256· OSTI ID:5993080
A parametric study of the threshold for pulsed-laser-induced damage with refractive index for surfaces and thin films of several transparent optical materials is reported. An empirical analysis of the experimental results obtained using 1.06-..mu..m radiation in approx.40-nsec pulses, together with published data, yields, to first order, a 1/(n/sup 2/-1) dependence for the threshold optical electric field. The proposed scaling law describes quite well the variation of damage threshold for optical surfaces ranging in refractive index from 1.38 to 2.49. Similar agreement is noted for homogeneous thin films deposited on a fused silica substrate; however, deviations are noted for inhomogeneous films.
Research Organization:
Air Force Weapons Laboratory, Kirtland Air Force Base, New Mexico 87117
OSTI ID:
5993080
Journal Information:
Opt. Lett.; (United States), Journal Name: Opt. Lett.; (United States) Vol. 4:8; ISSN OPLED
Country of Publication:
United States
Language:
English