Study of the effect of reactive element addition by implanting metal ions in a pre-formed oxide layer
- Lawrence Berkeley Lab., CA (USA)
- Electric Power Research Inst., Palo Alto, CA (USA)
The influence of ion-implanted Y, Hf, Zr and Cr on the oxidation behavior of a Ni-25 wt % CR alloy at 1000{degrees}C has been investigated. The implantation dosage was 5 {times} 10{sup 16} ions/cm{sup 2}. Two methods of implantation have been used. One was to implant ions directly into a clean alloy surface; the other was to implant into an approximately 0.6 {mu}m thick Cr{sub 2}O{sub 3} layer formed at 1000{degrees}C on the alloy. In neither case did the Cr implantation show any beneficial effects. Implantations of Y, Hf and Zr produced all the reactive element effects, i.e. reduction in oxidation rate, elimination of base metal oxide formation and improvement in scale adhesion, only if the ions were initially implanted in the alloy. When the ions were implanted in a preformed oxide, the subsequent oxidation process was altered to the same degree as before, but the scale adhesion was not affected. Implications of these results to the mechanism of the reactive element effect are discussed. 10 refs., 4 figs.
- Research Organization:
- Lawrence Berkeley Lab., CA (USA)
- Sponsoring Organization:
- EPRI; Electric Power Research Inst., Palo Alto, CA (USA)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 5980508
- Report Number(s):
- LBL-29522; CONF-900936--28; ON: DE91011916
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360105* -- Metals & Alloys-- Corrosion & Erosion
ADHESION
ALLOYS
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL ANALYSIS
CHROMIUM ALLOYS
CHROMIUM COMPOUNDS
CHROMIUM IONS
CHROMIUM OXIDES
GROWTH
HAFNIUM IONS
ION IMPLANTATION
ION MICROPROBE ANALYSIS
IONS
LAYERS
MASS SPECTROSCOPY
MICROANALYSIS
NICKEL ALLOYS
NICKEL BASE ALLOYS
NONDESTRUCTIVE ANALYSIS
OXIDES
OXYGEN COMPOUNDS
SCALING
SPECTROSCOPY
TRANSITION ELEMENT COMPOUNDS
VERY HIGH TEMPERATURE
YTTRIUM IONS
ZIRCONIUM IONS