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Study of the effect of reactive element addition by implanting metal ions in a pre-formed oxide layer

Conference ·
OSTI ID:5980508
;  [1];  [2]
  1. Lawrence Berkeley Lab., CA (USA)
  2. Electric Power Research Inst., Palo Alto, CA (USA)

The influence of ion-implanted Y, Hf, Zr and Cr on the oxidation behavior of a Ni-25 wt % CR alloy at 1000{degrees}C has been investigated. The implantation dosage was 5 {times} 10{sup 16} ions/cm{sup 2}. Two methods of implantation have been used. One was to implant ions directly into a clean alloy surface; the other was to implant into an approximately 0.6 {mu}m thick Cr{sub 2}O{sub 3} layer formed at 1000{degrees}C on the alloy. In neither case did the Cr implantation show any beneficial effects. Implantations of Y, Hf and Zr produced all the reactive element effects, i.e. reduction in oxidation rate, elimination of base metal oxide formation and improvement in scale adhesion, only if the ions were initially implanted in the alloy. When the ions were implanted in a preformed oxide, the subsequent oxidation process was altered to the same degree as before, but the scale adhesion was not affected. Implications of these results to the mechanism of the reactive element effect are discussed. 10 refs., 4 figs.

Research Organization:
Lawrence Berkeley Lab., CA (USA)
Sponsoring Organization:
EPRI; Electric Power Research Inst., Palo Alto, CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
5980508
Report Number(s):
LBL-29522; CONF-900936--28; ON: DE91011916
Country of Publication:
United States
Language:
English