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Title: Grain boundary phenomena in n-type CdTe films grown by hot wall vacuum evaporation

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.332532· OSTI ID:5970053

Films of n-type CdTe doped by coevaporation of indium have been deposited by hot wall vacuum evaporation on 7059 Corning glass and BaF/sub 2/ single crystal substrates. Layers deposited on glass show a dark resistivity of the order of 10/sup 5/ ..cap omega.. cm and a light resistivity of 500 ..cap omega.. cm under AM1.5; photoexcitation increases the electron density but does not affect the electron mobility. Layers deposited on BaF/sub 2/ show a dark resistivity of about 3 ..cap omega.. cm and a light resistivity of about 2 ..cap omega.. cm, corresponding to an electron density of 3.9 x 10/sup 16/ cm/sup -3/ and an electron mobility of 48 cm/sup 2//V s; illumination of these layers on BaF/sub 2/ increases the electron mobility but not the electron density. A quantitative model for grain boundary transport in polycrystalline materials is shown to give good agreement with the experimental data.

Research Organization:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305
OSTI ID:
5970053
Journal Information:
J. Appl. Phys.; (United States), Vol. 54:7
Country of Publication:
United States
Language:
English