Thresholds measured with 350-nm pulses at 25 to 100 Hz for bare polished crystals of CaF/sub 2/ and for silica sol-gel AR coatings on silica substrates
Conference
·
OSTI ID:5955971
An XeF laser-damage experiment was used to measure damage thresholds for bare polished crystals of CaF/sub 2/ and porous silica antireflection coatings on fused silica substrates. Damage was induced by applying 1000 350-nm, 25-ns pulses at repetition rates of 25 to 100 Hz to small (typically 0.12 x .03 cm) sites on the surfaces of the sample. Eight samples of fluorescence-free CaF/sub 2/ exhibited both surface and bulk damage at fluences as low as 10 J/cm/sup 2/. Three samples of UV-grade CaF/sub 2/ also had surface damage thresholds of 10 J/cm/sup 2/, and bulk damage was not observed in this material. Thresholds for the porous silica coatings were 17 to 23 J/cm/sup 2/.
- Research Organization:
- Lawrence Livermore National Lab., CA (USA)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 5955971
- Report Number(s):
- UCRL-93250; CONF-8510101-7; ON: DE86007117
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
ALKALINE EARTH METAL COMPOUNDS
ANTIREFLECTION COATINGS
CALCIUM COMPOUNDS
CALCIUM FLUORIDES
CALCIUM HALIDES
CHALCOGENIDES
COATINGS
CRYSTALS
DAMAGE
DOSES
ELECTROMAGNETIC RADIATION
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
IRRADIATION
LASER RADIATION
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PULSED IRRADIATION
RADIATION DOSES
RADIATIONS
RARE GAS COMPOUNDS
SILICA
SILICON COMPOUNDS
SILICON OXIDES
SURFACES
THRESHOLD DOSE
XENON COMPOUNDS
XENON FLUORIDES
360605* -- Materials-- Radiation Effects
ALKALINE EARTH METAL COMPOUNDS
ANTIREFLECTION COATINGS
CALCIUM COMPOUNDS
CALCIUM FLUORIDES
CALCIUM HALIDES
CHALCOGENIDES
COATINGS
CRYSTALS
DAMAGE
DOSES
ELECTROMAGNETIC RADIATION
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
IRRADIATION
LASER RADIATION
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PULSED IRRADIATION
RADIATION DOSES
RADIATIONS
RARE GAS COMPOUNDS
SILICA
SILICON COMPOUNDS
SILICON OXIDES
SURFACES
THRESHOLD DOSE
XENON COMPOUNDS
XENON FLUORIDES