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Narrowband, single line, 1. mu. s XeF laser

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98792· OSTI ID:5950675

A narrowband (5 GHz) electron beam pumped XeF oscillator/amplifier, lasing at 353.2 nm over a 1-..mu..s pulse duration, has been demonstrated. Line selection, bandwidth narrowing, and near-diffraction-limited output are achieved by using an echelle grating and an intracavity solid etalon in a stable oscillator configuration. The amplifier features an off-axis design and yields output energies approx. >0.8 J. The oscillator and amplifier are located in the same gas chamber and are transversely pumped by the same electron beam. A Fabry--Perot interferometer together with a streak camera is used to verify narrowband operation over the entire pulse duration.

Research Organization:
Spectra Technology, Inc., 2755 Northup Way, Bellevue, Washington 98004
OSTI ID:
5950675
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 51:14; ISSN APPLA
Country of Publication:
United States
Language:
English