A filamentless ion source for materials processing

Journal Article · Sun Feb 01 04:00:00 EST 1998 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1148470· OSTI ID:591908

Anders, A; MacGill, R A; Brown, I G ^[1]; Vizir, A ^[2]

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1. Ernest Orlando Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States)
2. High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055 (Russia)

A dual-stage, multiaperture gas ion source with 5 cm beam diameter has been built and characterized. The first discharge stage is a constricted glow discharge injecting a plasma stream into a discharge cavity supporting a Penning ion gauge discharge in the low pressure mode. Both discharge stages and ion extraction are fed by a single, grounded power supply. This simplifies the electrical setup and reduces costs. Various gases have been tested including nitrogen, oxygen, and argon. The ion beam current density is 250 {mu}A/cm{sup 2}, i.e., the beam current is about 5 mA, at an extraction voltage of 3.0 kV and a discharge current of 59 mA. Measurements of the ion beam current as a function of various parameters such as the discharge voltage and current, gas flow, and magnetic field are presented. The source is compact and can be easily adapted to various materials modification applications in which ion energies of a few keV are required. {copyright} {ital 1998 American Institute of Physics.}

• OSTI ID: 591908
• Report Number(s): CONF-980145--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 2 Vol. 69; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
CURRENT DENSITY
GAS FLOW
GLOW DISCHARGES
ION SOURCES
KEV RANGE
NITROGEN
OPERATION
OXYGEN
PENNING DISCHARGES
PENNING ION SOURCES