A plasma window for vacuum{endash}atmosphere interface and focusing lens of sources for nonvacuum ion material modification (invited)

Journal Article · Sun Feb 01 00:00:00 EST 1998 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1148468· OSTI ID:591905

Hershcovitch, A ^[1]

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1. AGS Department, Brookhaven National Laboratory, Upton, New York 11973-5000 (United States)

Material modifications by ion implantation, dry etching, and microfabrication are widely used technologies, all of which are performed in vacuum, since ion beams at energies used in these applications are completely attenuated by foils or by long differentially pumped sections, which are currently used to interface between vacuum and atmosphere. A novel plasma window, which utilizes a short arc for vacuum{endash}atmosphere interface, has been developed. This window provides for sufficient vacuum atmosphere separation, as well as for ion beam propagation through it, thus facilitating nonvacuum ion material modification. {copyright} {ital 1998 American Institute of Physics.}

• OSTI ID: 591905
• Report Number(s): CONF-980145-; ISSN 0034-6748; TRN: 98:004860
• Journal Information: Review of Scientific Instruments, Vol. 69, Issue 2; Conference: 7. international conference on ion sources, Shirahama (Japan), 26-27 Jan 1998; Other Information: PBD: Feb 1998
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
70 PLASMA PHYSICS AND FUSION
ION BEAMS
VACUUM SYSTEMS
WINDOWS
ETCHING
FABRICATION
ION SOURCES
LENSES