Production of microbunched beams of very highly charged ions with an electron beam ion source
- Department of Physics, J. R. Macdonald Laboratory, Kansas State University, Manhattan, Kansas 66506 (United States)
Electron beam ion sources produce very highly charged ions most efficiently in a batch mode as the confinement time can be directly optimized for the production of the desired charge state. If, after confinement, the voltage of the ion-confining downstream dam is lowered rapidly, all ions escape and form an ion beam pulse with a length of a few tens of {mu}s. Raising the main trap voltage while maintaining a constant dam voltage in a {open_quotes}spill-over expulsion{close_quotes} reduces the energy spread of the expelled ions. The longer time periods of {open_quotes}slow-,{close_quotes} {open_quotes}leaky batch mode-,{close_quotes} and {open_quotes}direct current (dc) batch mode-{close_quotes} expulsions allow for increasing the ion beam duty cycle. Combining the rapid expulsion with one of the latter methods allows for the expulsion of the ions of a single batch in many small microbunches with variable intervals, maintaining the low energy spread and the increased duty cycle of slow expulsions. Combining the {open_quotes}microbunching{close_quotes} with {open_quotes}dc batch mode production{close_quotes} and a multitrap operation will eventually allow for the production of equally intense ion bunches over a wide range of frequencies without any deadtime, and with minimal compromise on the most efficient production parameters. {copyright} {ital 1998 American Institute of Physics.}
- OSTI ID:
- 591874
- Report Number(s):
- CONF-980145-; ISSN 0034-6748; TRN: 98:004846
- Journal Information:
- Review of Scientific Instruments, Vol. 69, Issue 2; Conference: 7. international conference on ion sources, Shirahama (Japan), 26-27 Jan 1998; Other Information: PBD: Feb 1998
- Country of Publication:
- United States
- Language:
- English
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