XeCl excimer laser excited by longitudinal discharge
Journal Article
·
· Appl. Phys. Lett.; (United States)
XeCl excimer laser excited by longitudinal gas discharge is reported. The main characteristics of the laser output and the laser energy in dependence of the operating parameters were measured. The laser pulse duration was 35 ns and the maximum laser energy 317 ..mu..J with improvement by preionization.
- Research Organization:
- Shanghai Insitute of Laser Technology, 319 Yue Yang Road, Shanghai 200031, China
- OSTI ID:
- 5917284
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:4; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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