Multilayer mirrors as power filters in insertion device beamlines

Journal Article · Sat Jul 01 04:00:00 EDT 1989 · Rev. Sci. Instrum.; (United States)

DOI:https://doi.org/10.1063/1.1141083· OSTI ID:5908714

Kortright, J B; DiGennaro, R S

The power-filtering capabilities of multilayer bandpass x-ray mirrors relative to total reflection low-pass mirrors are presented. Results are based on calculations assuming proposed wiggler sources on the upcoming generation of low-energy (1.5 GeV) and high-energy (7.0 GeV) synchrotron radiation sources. Results show that multilayers outperform total reflection mirrors in terms of reduction in reflected power by roughly an order of magnitude, with relatively small increases in total absorbed power and power density over total reflection mirrors, and with comparable reflected flux values. Various aspects of this potential application of multilayer x-ray optics are discussed.

• Research Organization: Center for X-ray Optics, Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 5908714
• Journal Information: Rev. Sci. Instrum.; (United States), Journal Name: Rev. Sci. Instrum.; (United States) Vol. 60:7; ISSN RSINA
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
430302* -- Particle Accelerators-- Injection & Extraction Systems
430400 -- Particle Accelerators-- Storage Rings
BREMSSTRAHLUNG
EFFICIENCY
ELECTRICAL EQUIPMENT
ELECTROMAGNETIC FILTERS
ELECTROMAGNETIC RADIATION
ELECTROMAGNETS
ENERGY RANGE
EQUIPMENT
FILTERS
GEV RANGE
GEV RANGE 01-10
IONIZING RADIATIONS
LIGHT SOURCES
MAGNETS
MIRRORS
POWER
RADIATION SOURCES
RADIATIONS
REFLECTION
SYNCHROTRON RADIATION
WIGGLER MAGNETS
X RADIATION
X-RAY EQUIPMENT