Scattering apodizer for laser beams
A method is disclosed for apodizing a laser beam to smooth out the production of diffraction peaks due to optical discontinuities in the path of the laser beam, sich method comprising introduction of a pattern of scattering elements for reducing the peak intensity in the region of such optical discontinuities, such pattern having smoothly tapering boundaries in which the distribution density of the scattering elements is tapered gradually to produce small gradients in the distribution density, such pattern of scattering elements being effective to reduce and smooth out the diffraction effects which would otherwise be produced. The apodizer pattern may be produced by selectively blasting a surface of a transparent member with fine abrasive particles to produce a multitude of minute pits. On one embodiment, a scattering apodizer pattern is employed to overcome diffraction patterns in a multiple element crystal array for harmonic conversion of a laser beam. The interstices and the supporting grid between the crystal elements are obsecured by the gradually tapered apodizer pattern of scattering elements.
- Assignee:
- The United States of America as represented by the United States Department of Energy
- Patent Number(s):
- US 4537475
- OSTI ID:
- 5893899
- Country of Publication:
- United States
- Language:
- English
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Scattering apodizer for laser beams
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