Adsorption of NO on Ni(755): competitive adsorption of oxygen and nitrogen atoms along a step line of Ni(755)

Journal Article · Thu Sep 10 04:00:00 EDT 1987 · J. Phys. Chem.; (United States)

DOI:https://doi.org/10.1021/j100303a041· OSTI ID:5890537

Nozoye, H

The adsorption of NO on Ni(755) was studied by means of temperature-programmed desorption (TPD) and Auger electron spectroscopy (AES). A peculiar behavior of TPD spectra for N/sub 2/ can be explained by a competitive adsorption of oxygen and nitrogen atoms along a step line of Ni(755). The adsorption energy of oxygen atoms along a step line is higher than that of nitrogen atoms.

• Research Organization: National Chemical Laboratory for Industry, Ibaraki, Japan
• OSTI ID: 5890537
• Journal Information: J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 91:19; ISSN JPCHA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
ADSORPTION
ADSORPTION HEAT
CHALCOGENIDES
DATA
ELEMENTS
ENTHALPY
EXPERIMENTAL DATA
INFORMATION
METALS
NICKEL
NITRIC OXIDE
NITROGEN
NITROGEN COMPOUNDS
NITROGEN OXIDES
NONMETALS
NUMERICAL DATA
OXIDES
OXYGEN
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SORPTION
TEMPERATURE EFFECTS
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENTS