Temperature-dependent absorption processes in the XeF laser

Journal Article · Mon Oct 01 00:00:00 EDT 1979 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.91192· OSTI ID:5886925

Champagne, L F

Temperature-dependent absorption processes in neon/xenon/NF/sub 3/ mixtures are reported. In pure neon plasmas there are two types of absorption present; a broad but weak band of absorption is observed, which increases with increasing temperature, and a strong narrow band of absorption is observed around 351 nm. Moderate heating reduces this absorption. Improved performance of the XeF laser at elevated temperature is primarily due to reduced absorption in the laser medium at 351 nm.

• Research Organization: Laser Physics Branch, Optical Sciences Division, Naval Research Laboratory, Washington, D.C. 20375
• OSTI ID: 5886925
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 35:7; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ABSORPTION
DISPERSIONS
ELEMENTS
EMISSION
ENERGY-LEVEL TRANSITIONS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
HEATING
LASERS
MIXTURES
NEON
NITROGEN COMPOUNDS
NITROGEN FLUORIDES
NONMETALS
PLASMA
RARE GAS COMPOUNDS
RARE GASES
SPECTRA
STIMULATED EMISSION
TEMPERATURE DEPENDENCE
WAVELENGTHS
XENON COMPOUNDS
XENON FLUORIDES