Laser photolysis of aryl-substituted digermanes. Generation of germyl radicals and germylenes
Journal Article
·
· Organometallics; (United States)
The photochemistry of organosilicon compounds having a /sigma/(Si-Si)-/pi/(C-C) conjugated system has been the subject of considerable interest in recent years. However, there have been few reports on photochemical studies of the germanium analogue. The authors describe herein the first laser photolysis studies on the aryl-substituted digermanes (Ph/sub n/Me/sub 3-n/Ge)/sub 2/ (1-3, n = 1-3, respectively). Photolysis of the phenylated digermanes causes germanium-germanium bond homolysis which leads to the formation of a germyl radical and probably a germylene.
- Research Organization:
- Gakushuin Univ., Tokyo (Japan)
- OSTI ID:
- 5852396
- Journal Information:
- Organometallics; (United States), Journal Name: Organometallics; (United States) Vol. 7:8; ISSN ORGND
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500* -- Photochemistry
CHEMICAL PREPARATION
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISTRY
DATA
DECOMPOSITION
EXPERIMENTAL DATA
GERMANIUM COMPOUNDS
INFORMATION
KINETICS
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOCHEMISTRY
PHOTOLYSIS
RADICALS
REACTION KINETICS
SYNTHESIS
400500* -- Photochemistry
CHEMICAL PREPARATION
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISTRY
DATA
DECOMPOSITION
EXPERIMENTAL DATA
GERMANIUM COMPOUNDS
INFORMATION
KINETICS
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOCHEMISTRY
PHOTOLYSIS
RADICALS
REACTION KINETICS
SYNTHESIS