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Laser photolysis of aryl-substituted digermanes. Generation of germyl radicals and germylenes

Journal Article · · Organometallics; (United States)
DOI:https://doi.org/10.1021/om00098a029· OSTI ID:5852396
The photochemistry of organosilicon compounds having a /sigma/(Si-Si)-/pi/(C-C) conjugated system has been the subject of considerable interest in recent years. However, there have been few reports on photochemical studies of the germanium analogue. The authors describe herein the first laser photolysis studies on the aryl-substituted digermanes (Ph/sub n/Me/sub 3-n/Ge)/sub 2/ (1-3, n = 1-3, respectively). Photolysis of the phenylated digermanes causes germanium-germanium bond homolysis which leads to the formation of a germyl radical and probably a germylene.
Research Organization:
Gakushuin Univ., Tokyo (Japan)
OSTI ID:
5852396
Journal Information:
Organometallics; (United States), Journal Name: Organometallics; (United States) Vol. 7:8; ISSN ORGND
Country of Publication:
United States
Language:
English