Electrodeposition of Bi-Te alloy films

Journal Article · Wed Sep 01 04:00:00 EDT 1993 · Journal of the Electrochemical Society; (United States)

DOI:https://doi.org/10.1149/1.2220860· OSTI ID:5843522

Takahashi, Makoto; Oda, Youichi; Ogino, Takayuki; Furuta, Shinsaku ^[1]

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1. Chubu Univ., Aichi (Japan). Dept. of Industrial Chemistry

Electrochemical deposition of Bi-Te alloy films from acidic solutions containing Bi(NO[sub 3])[sub 3] and TeO[sub 2] has been investigated. The thickness, compound, and composition of the Bi-Te alloy films have been examined using stylus-type surface profiling techniques, X-ray diffraction peak measurement, and inductively coupled plasma/Auger electron spectroscopy measurements. At potentials where limiting current was observed, the compositions of films were controlled by the mole ratio [Bi[sup 3+]]/[HTeO[sup +][sub 2]] in the solutions and the relationship between the composition of electrodeposited films and the composition of electrolyte solutions was derived.

• OSTI ID: 5843522
• Journal Information: Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 140:9; ISSN 0013-4651; ISSN JESOAN
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
ALLOYS
BISMUTH ALLOYS
BISMUTH COMPOUNDS
BISMUTH NITRATES
CHALCOGENIDES
CHEMICAL COMPOSITION
COATINGS
DATA
DEPOSITION
DIMENSIONS
ELECTRIC POTENTIAL
ELECTRODEPOSITED COATINGS
ELECTRODEPOSITION
ELECTROLYSIS
ELECTROLYTES
EXPERIMENTAL DATA
INFORMATION
LYSIS
NITRATES
NITROGEN COMPOUNDS
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
SURFACE COATING
TELLURIUM ALLOYS
TELLURIUM COMPOUNDS
TELLURIUM OXIDES
THICKNESS