Formation, decomposition, and electrical transport properties of amorphous Hf-Ni and Hf-Co alloys

Journal Article · Mon Oct 01 04:00:00 EDT 1979 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.325724· OSTI ID:5836604

Buschow, K H.J.; Beekmans, N M

Amorphous Hf/sub 1-x/Ni/sub x/ and Hf/sub 1-x/Co/sub x/ alloys in the concentration range 0.2< or =x< or =0.9 were prepared by melt spinning. The crystallization behavior of these alloys was studied by means of differential scanning calorimetry and x-ray diffraction. At least two new compounds in the Hf-Ni system were observed to be formed upon crystallization of the amorphous alloys. The electrical resistivity (rho) in the amorphous alloys and in crystalline HfNi/sub 5/ was studied in the range from 4.2 to 300 K. Negative temperature dependences of rho were observed in several of the amorphous alloys, extending from x=0.25 to x=0.65 in Hf/sub 1-x/Ni/sub x/. The thermal stability of the amorphous alloys is discussed in terms of a diffusion mechanism. The extended Ziman theory of liquid metals was used in the interpretation of the temperature dependence of the resistivity.

• Research Organization: Philips Research Laboratories, Eindhoven, The Netherlands
• OSTI ID: 5836604
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 50:10; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102 -- Metals &amp; Alloys-- Structure &amp; Phase Studies
360104* -- Metals &amp; Alloys-- Physical Properties
ALLOYS
AMORPHOUS STATE
CALORIMETRY
CHEMICAL REACTIONS
COBALT ALLOYS
COHERENT SCATTERING
CRYSTALLIZATION
DECOMPOSITION
DIFFRACTION
ELECTRICAL PROPERTIES
HAFNIUM ALLOYS
NICKEL ALLOYS
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
QUANTITY RATIO
SCATTERING
SYNTHESIS
X-RAY DIFFRACTION