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Experimental investigation of the infrared absorption saturation in p-type germanium and silicon

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93056· OSTI ID:5808758
We investigate the room-temperature absorption saturation of p-Ge and p-Si for several samples over a range of doping densities for light having wavelengths of 10.6 and 9.6 ..mu..m. The transmission data can be fairly well described using an intensity dependent absorption coefficient characteristic of an inhomogeneously broadened two-level system. Measurements of the saturation intensity of p-Ge show that I/sub s/ increases monotonically with increasing hole concentration, and that the resonant transition is significantly easier to saturate in p-Ge than in p-Si for the samples we examined.
Research Organization:
California Institute of Technology, Pasadena, California 91125
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
5808758
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:3; ISSN APPLA
Country of Publication:
United States
Language:
English