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Title: The effects of ionizing radiation on the breakdown voltage of p-channel power MOSFETs

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (USA)
OSTI ID:5772191
; ; ;  [1]
  1. Arizona Univ., Tucson, AZ (USA). Dept. of Electrical and Computer Engineering

The effects of ionizing radiation on the breakdown voltage of p-channel power MOSFETs were examined through two-dimensional simulation. Breakdown-voltage performance of p-channel power MOSFETs was found to be very different from corresponding n-channel power MOSFETs. In p-channel devices, simulation showed breakdown-voltage enhancement for low values of positive oxide-trapped charge, {ital N{sub ot}}, whereas for high values of {ital N{sub ot}}, the breakdown voltage may or may not continue to increase, and may actually decrease in some topologies. For comparison, in n-channel devices, increases in {ital N{sub ot}} always cause breakdown-voltage degradation. The uncertainties stem from the interaction of the depletion region of the device (which is a function of its termination method) with its isolation technology, making it difficult to predict breakdown voltage for large {ital N{sub ot}}. However, insights gained through analysis of depletion-region spreading in p-channel devices suggest a termination/isolation scheme, the VLD-FRR, that will enhance p-channel device reliability in radiation environments.

OSTI ID:
5772191
Report Number(s):
CONF-900723-; CODEN: IETNA; TRN: 91-014535
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (USA), Vol. 37:6; Conference: 27. IEEE annual conference on nuclear and space radiation effects, Reno, NV (USA), 16-20 Jul 1990; ISSN 0018-9499
Country of Publication:
United States
Language:
English

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